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Low-loss, silicon integrated, aluminum nitride photonic circuits and their use for electro-optic signal processing

机译:低损耗,硅集成,氮化铝光子电路和   它们用于电光信号处理

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摘要

Photonic miniaturization requires seamless integration of linear andnonlinear optical components to achieve passive and active functionssimultaneously. Among the available material systems, silicon photonics holdsimmense promise for optical signal processing and on-chip optical networks.However, silicon is limited to wavelengths above 1100 nm and does not providethe desired lowest order optical nonlinearity for active signal processing.Here we report the integration of aluminum nitride (AlN) films on siliconsubstrates to bring active functionalities to chip-scale photonics. UsingCMOS-compatible sputtered thin films we fabricate AlN-on-insulator waveguidesthat exhibit low propagation loss (0.6 dB/cm). Exploiting AlN's inherentPockels effect we demonstrate electro-optic modulation up to 4.5 Gb/s with verylow energy consumption (down to 10 fJ/bit). The ultra-wide transparency windowof AlN devices also enables high speed modulation at visible wavelengths. Ourlow cost, wideband, carrier-free photonic circuits hold promise for ultra-lowpower and high speed signal processing at the microprocessor chip level.
机译:光子小型化需要线性和非线性光学组件的无缝集成,以同时实现被动和主动功能。在可用的材料系统中,硅光子技术在光信号处理和片上光网络方面具有广阔的前景,但是硅限于1100 nm以上的波长,并且不能为有源信号处理提供所需的最低阶光学非线性。在硅基板上沉积氮化铝(AlN)膜,以将有源功能带入芯片级光子学。使用兼容CMOS的溅射薄膜,我们可以制造出传播损耗低(0.6 dB / cm)的绝缘体上AlN波导。利用AlN固有的Pockels效应,我们展示了电光调制速度高达4.5 Gb / s,能耗极低(低至10 fJ / bit)。 AlN器件的超宽透明窗口还可以在可见波长下进行高速调制。我们的低成本,宽带,无载波的光子电路有望在微处理器芯片级别实现超低功耗和高速信号处理。

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